We are working on tiny things that are invisible to the bare eye, but they’ve been shaping our reality for more than half a century. We are talking about micro and nanodevices. ATLANT 3D specializes in advanced nanotechnology, focusing on the development and application of our Direct Atomic Layer Processing (DALP®) technology. This innovative approach is instrumental in advancing the field of micro and nanodevice fabrication, offering precise control over material deposition and etching processes. The invention relates to an atomic layer process printer for material deposition, etching and/or cleaning on an atomic scale in a selective area. The invention further relates to a method for material deposition, etching and/or cleaning on an atomic scale in a selective area using the atomic layer process printer. The invention of atomic-layer additive manufacturing (ALAM): In ALAM, controlled surface chemistry is performed with spatially constrained flows of molecular precursors delivered to the substrate from a microfluidic nozzle. Each pass of the nozzle over any point of the substrate deposits one monolayer of solid. Repeated passes allow for direct patterning deposition of functional materials with Angström vertical resolution. Area-selective atomic layer deposition (AS-ALD) is a bottom-up nanofabrication method delivering single atoms from a molecular precursor. AS-ALD enables self-aligned fabrication and outperforms lithography in terms of cost, resistance, and equipment prerequisites, but it requires pre-patterned substrates and is limited by insufficient selectivity and finite choice of substrates. Scientific Discoveries
Innovation & Technology Exploring the Depths of Nanotechnology – Where Precision Meets Innovation
PATENT Atomic Layer Process Printer
Scientific Papers
Small Methods 5/2022 Additive Manufacturing in Atomic Layer Processing Mode
Volume19, Issue36 Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor
